Perfluoroelastomers (MOSEZ)


Perfluoroelastomer O-rings are high-performance sealing materials that provide excellent resistance to high temperatures, chemicals, and various gases. They are mainly used in the petrochemical, semiconductor, and aerospace industries, delivering stable performance even in extreme environments. Although costly, they offer long service life and high reliability.
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01
They exhibit outstanding resistance to most chemicals, solvents, acids, alkalis, and high-temperature gases, making them suitable for use in harsh conditions.
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02
They maintain their physical properties and operate reliably even at high temperatures exceeding 300°C.
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03
They withstand high pressure and abrasion, ensuring consistent performance over long periods.
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04
They possess high durability in plasma environments generated during semiconductor manufacturing processes, allowing use without performance degradation.
Process | MOSEZ Ⓡ Max. Temp. | DuPont™ Kalrez Ⓡ | GreeneTweed™ Chemraz Ⓡ | MOS™ MOSEZ Ⓡ | Features |
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HDPCVD PECVD SACVD |
300 ℃ | 9100 | 3060DB | Low erosion rate and ultra-low particle generation in oxygen and fluorine-based plasma | |
HDPCVD PECVD |
300 ℃ | 8085 | 3070E | Specifically manufactured to minimize particle generation in NF3 plasma | |
LPCVD RTP |
300 ℃ | 8475 | 3070Ⅰ | Reduced low gas emission and improved compression set resistance | |
Wet Process |
275 ℃ | 6375 | 2780B | Wide chemical resistance and heat resistance | |
Oxidation Diffusion MCVD ALD, LPCVD |
320 ℃ | 8900 | 3280B | Wide chemical resistance and heat resistance | |
CVD RPCVD APCVD DCVD |
230 ℃ | E38 | 2380W | Resistant to various aggressive chemicals with superior physical properties |